Currently, Hanoi University of Industry has approximately 35,000 students, including 12,000 students majoring in fields related to electrical engineering, electronic engineering, telecommunications, computer engineering, and information technology. HaUI has already delivered some courses related to microchip design.

This year, HaUI has commenced admissions and in-depth training in IC Design. Students who graduated from a Bachelor program closely related to Electronics, such as Electrical Engineering, Telecommunications, Computer Engineering Technology, will be awarded an engineering degree upon completion of the training program, which lasts from 1 to 1.5 years.

Dr. Kieu Xuan Thuc, Rector of Hanoi University of Industry stated that the university is collaborating with businesses to develop a curriculum, providing knowledge and skills relevant to practical needs. In addition to the industry-aligned curriculum, HaUI is investing in equipment, including a modern IC design toolset, to efficiently support research and teaching activities.

With positive outcomes in the collaboration between the two parties, Dr. Kieu Xuan Thuc expressed his hope that Siemens would support HaUI in enhancing the capabilities of lecturers, providing design software to offer students access to advanced and modern technology during their studies.

Nina Lin, Vice President, General Manager Taiwan & PacRim South of Siemens EDA, stated that stated that 50 major technology companies worldwide are currently utilizing Siemens' technology. Presently, the company possesses the most advanced chip design technologies, characterized by a high level of complexity. Siemens is committed to consistently supporting Hanoi University of Industry in the process of training high-quality human resources, establishing the IC Design Lab, thereby contributing to the development of the semiconductor industry in Vietnam.

At the working session, the delegation spent time visiting the Faculty of Electronic Engineering and the Smart Factory of Hanoi University of Industry.